| 二次灌浆在电解槽沉降基础加固复位中的应用 |
| 投稿时间：2009-03-08 修订日期：2009-06-24 点此下载全文 |
| 引用本文：廖培涛,韦兴标.二次灌浆在电解槽沉降基础加固复位中的应用[J].钻探工程,2009,36(7):53-56.LIAO Pei-tao,WEI Xing-biao. Application of Secondary Cementation in Electrolytic Cell Foundation Settlement Reinforcement and Restoration[J]. Drilling Engineering, 2009,36(7):53-56. |
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| 中文摘要:广西某电解铝车间电解槽沉降基础在采用直孔帷幕灌浆加固的基础上，利用斜孔在有限空间进行二次灌浆加固复位，通过合理控制灌浆压力和灌浆量或间歇灌浆等措施，实行测量跟踪观测控制每次灌浆的抬升量，成功地将电解槽沉降基础抬升复位。 |
| 中文关键词:电解槽沉降基础 帷幕灌浆 斜孔二次灌浆 加固复位 跟踪观测 |
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| Application of Secondary Cementation in Electrolytic Cell Foundation Settlement Reinforcement and Restoration |
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| Abstract:Based on the straight hole curtain grouting reinforcement for an electrolytic cell foundation settlement, the second cementation was applied for reinforcement and restoration by inclined hole. By the means of reasonable control on grouting pressure & grouting amount and with the intermittent grouting technology, every lifting level was monitored and controlled; electrolytic cell foundation settlement was successfully restored. |
| keywords:electrolytic cell foundation settlement curtain grouting the second cementation by inclined hole reinforcement and restoration tracking observation |
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